论文编号: 172511O120120318
第一作者所在部门: 四室一组
论文题目:
论文题目英文:
作者: 金智
论文出处:
刊物名称: CHINESE SCI BULL
: 2012
: 57
: 19
: 2401
联系作者: 金智
收录类别:
影响因子: 0.732
摘要: We report on a demonstration of top-gated graphene field-effect transistors (FETs) fabricated on epitaxial SiC substrate. Compo- site stacks, benzocyclobutene and atomic layer deposition Al O , are used as the gate dielectrics to maintain intrinsic carrier mo- 2 3 bility of graphene. All graphene FETs exhibit n-type transistor characteristics and the drain current is nearly linear dependence on 2 /(V s), a maximum cutoff frequency of 4.6 GHz and a max- gate and drain voltages. Despite a low field-effect mobility of 40 cm imum oscillation frequency of 1.5 GHz were obtained for the graphene devices with a gate length of 1 μm.
英文摘要:
外单位作者单位:
备注: SCI收录